By Kurt E. Geckeler, Hiroyuki Nishide
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Extra resources for Advanced Nanomaterials, Two Volume Edition
This is often achieved through the copolymerization of more than one type of monomer, each having its own functionality in the photoresist. The realm of photolithography is split into two families of chemistry, based on the different physical properties possible for the exposed photoresist: • Positive-tone resist chemistry refers to a photoresist that becomes more soluble after exposure to UV light. This can happen because of chemical deprotection, bond rearrangement, or chain-scission mechanisms.
Several different types of BCP systems have been used as nanolithographic templates, such as poly(styrene-blockbutadiene), poly(styrene-block-methyl methacrylate), poly(styrene-block- ferrocenyldimethylsilane), poly(styrene-block-lactic acid) and poly(α-methylstyreneblock-hydroxystyrene). 2. Poly(Styrene-block-Butadiene) One of the ﬁrst applications in this area also provides a model example of the concept of BCP lithography. 10a. 10b shows how ozone was used to eliminate the PB spherical minority phase and open up windows in the PS matrix.
Processing the ﬁlm entailed hydrolytically crosslinking the silyl-containing block to prevent pore collapse, and ozonolysis to eliminate the isoprene minority domain . Another group subsequently discovered a one-step, room-temperature UV irradiation/ ozonolysis treatment to transform the matrix into a silicon oxycarbide ceramic and eliminate the polydiene minority phase. The silicon oxycarbide ceramic was stable at temperatures up to 400 °C, and adjustment of the volume fraction of the BCP afforded an inverse bicontinuous phase to produce a nanorelief structure .
Advanced Nanomaterials, Two Volume Edition by Kurt E. Geckeler, Hiroyuki Nishide